Luffa & Amino Acid Moisturising Facial Mask 1pcs

• Japanese Luffa Cylindrica Essence contains herbal composition ingredients that can effectively seal in water and gently soothe discomfort after exposure to the sun.

• It softens deep down and repairs the skin membrane, keeping skin surface intact and restoring normal radiance and vitality.

• Added with Hyaluronic acid and other moisturizing firming ingredients that focus on providing moisture onto skin and smooths out fine lines and prevent skin aging.

■Suited to: Most skin types, particularly dry skin, winter and cool climates, and air-conditioned environs

■Skin feel: Hydrated

• 含玻尿酸丝瓜和氨基酸。

• 有效的呵护肌肤，保湿，和滋润肌肤。

• 长久使用可以抚平细纹，延缓肌肤老化。

INGREDIENT

Water/Aqua, Dipropylene Glycol, Grycosyl Trehalose, Hydrogenated Starch Hydrolysate, Diglycerin,Polyglycerin-3, PEG/PPG/Polybutylene Glycol-8/5/3 Glycerin, PPG-28-Buteth-35,Olive Oil PEG-7 Esters, Niacinamide, PEG-40 Hydrogenated Castor Oil, Pentylene Glycol, Sodium PCA, Phenoxyethanol, Xanthan Gum, Methylparaben, Panthenol, Sodium Hyaluronate, Hydrolyzed Hyaluronic Acid, Allantoin, Dipotassium Glycyrrhizate, Acrylates/Vinyl Isodecanote Crosspolymer, Sodium Carbomer, Sodium Lactate, Arginine, Aspartic Acid, PCA, Glycine, Alanine, Serine, Valine, Proline, Threonine, Isoleucine, Histidine, Phenylalanine, Ceramide NP, Ceramide AP, Ceramide EOP, Phytosphingosine, Cholesterol, Leucine, Tyrosine, Asparagine, Tryptophan, Magnesium PCA, Copper Tripeptide-1, Urea, Creatine, Glucosamine HCI, Taurine, Glutamic Acid, Glutamine, Citrulline, Cysteine, Methionine, Ornithine, Lysine, Luffa Cylindrica Fruit/Leaf/Stem Extract, lycyrrhiza Glabra (Licorice) Root Extract, Aloe Barbadensis Leaf Juice, Saccharomyces/Coix Lacryma-Jobi-Ma-Yuen Seed Ferment Filtrate, Hydrolyzed Soybean Extr

*Please refer to the ingredients list on the product packaging for the most accurate list of ingredients.

SPECIFICATION & USAGE

Apply mask on cleansed and toned face for 10-15 minutes. Pat in any remaining essence and apply moisturizer to seal in essence.